Effect of Impurity in Discharge Gas on High γ Properties of Newly Developed CeSrO Film for Novel Plasma Display Panel
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概要
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The discharge properties and chemical surface stability of CeO2 containing Sr (CeSrO) as the candidate for high-γ protective layer of noble plasma display panels (PDPs) are characterized. CeSrO films have superior chemical stability, because of the decrease in reactiveness on surface due to their fluorite structure. The discharge voltage is 50V lower than that of MgO films for a pure discharge gas of Ne/Xe =85/15 at 60kPa. However the topmost surface, monolayer, of the CeSrO film relevant to the discharge property is hardly recovered from the damage by CO2 impurity in discharge gas. We can expect that by pumping down to a sufficiently low CO2 partial pressure (lower than 1×10-3Pa), PDP panels with very high efficiency are realized with CeSrO protective layer.
著者
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Yamauchi Yasushi
National Institute for Materials Science
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Nishitani Mikihiko
Image Devices Development Center, Matsushita Electric Industrial Co., Ltd., 3-1-1 Yagumo-naka-machi, Moriguchi, Osaka 570-8501, Japan
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Honda Yosuke
Image Devices Development Center, Panasonic Corporation, Moriguchi, Osaka 570-8501, Japan
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YAMAUCHI Yasuhiro
Image Devices Development Center, Panasonic Corp.
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SAKAI Masahiro
Image Devices Development Center, Panasonic Corp.
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FUKUI Yusuke
Image Devices Development Center, Panasonic Corp.
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OKAFUJI Michiko
Image Devices Development Center, Panasonic Corp.
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NISHITANI Mikihiko
Image Devices Development Center, Panasonic Corp.
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YAMAUCHI Yasushi
National Institute of Material Science
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HONDA Yosuke
Image Devices Development Center, Panasonic Corp.
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