Microlithography Using Metastable Helium Atoms: Patterning of Gold Film Coated with Dodecanethiol Self-Assembled Monolayers on Mica

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In this paper, we report the establishment of an experimental setup and the procedure used for metastable atom lithography. Using a helium metastable atom beam and dodecanethiol (DDT) self-assembled monolayer (SAM), we carried out the patterning of the gold film on muscovite mica having a flat surface. Large-area intact and flat patterns with a nanoscale width of ${\sim}80--110$ nm, of the etched step were obtained. From the analysis of the roughness, it was determined that no remaining gold islands were present in the area exposed to the He* atom beam under the optimized experimental parameters: 40–60 min. of exposure time and 8–10 min. of etching time. In addition, the presence of some flaws in the patterns was considered to be due to the scratches on mica substrate.
2003-07-15