The trapping and release of injected hydrogen isotopes in vitreous silica.

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概要

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• The behavior in vitreous silica of hydrogen isotopes, which had been introduced by 80-keV D<SUP>+</SUP>-ion implantation, thermal D<SUB>2</SUB> doping, or recoil tritium implantation (2.7 MeV), was studied by means of FT-IR spectroscopy, ESR spectroscopy, and radioassay with a liquid scintillation counter. The hydrogen isotopes are trapped by forming hydroxyl bonds (OD, OT). In the D<SUP>+</SUP>-ion implantation, OD bonds are formed mainly by the rupture of the ≡Si–O–Si≡ bonds. In the thermal D<SUB>2</SUB> doping, however, OD bonds are formed mainly by the isotope-exchange reaction between the preexisting OH bonds and D<SUB>2</SUB> molecules. When vitreous silica implanted by recoil tritium is heated to about 1150 K, HTO and HT are released. The OD bonds produced by D<SUP>+</SUP> implantation decrease upon annealing at 1150 K. The OD bond-rupture is controlled by the diffusion of hydrogen isotopes trapped as OD(OT) bonds to the surface of vitreous silica. The mechanism of the diffusion of the hydrogen isotopes through vitreous silica was explained in terms of a repetition of the chemical reaction of ≡SiOD(OT)+≡SiOSi≡→≡SiOSi≡+SiOD(OT). The diffusion coefficient (<I>D</I><SUB>T</SUB>HTO)) of tritium according to the above mechanism was obtained as:<BR><I>D</I><SUB>T</SUB>(HTO)=2.3×10<SUP>−4</SUP>exp[−1.7×10<SUP>2</SUP>(kJ mol<SUP>−1</SUP>)⁄<I>RT</I>]cm<SUP>2</SUP>s<SUP>−1</SUP>

• 公益社団法人 日本化学会の論文

著者

• Saeki Masakatsu

  Department Of Chemistry Japan Atomic Energy Research Institute

• Miyazaki Tetsuo

  Department Of Applied Chemistry Graduate School Of Engineering Nagoya University

• Azuma Naoto

  Department Of Materials Science Shizuoka University

• ARATONO Yasuyuki

  Department of Chemistry, Japan Atomic Energy Research Institute

• Fueki Kenji

  Department of Chemistry Faculty of Science Osaka University

• Tachikawa Enzo

  Department of Chemistry, Japan Atomic Energy Research Institute

• Furukawa Katsutoshi

  Department of Chemistry, Japan Atomic Energy Research Institute

• Ohno Shin-ichi

  Department of Chemistry, Japan Atomic Energy Research Institute

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