Photoanodic formation of an organic monolayer on a hydrogen-terminated Si(111) surface via Si–C covalent bond using a Grignard reagent and its application for one-step monolayer-patterning

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概要

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• Alkyl monolayer (octadecyl) was formed on a hydrogen-terminated Si(1 1 1) (H–Si(1 1 1)) electrode via Si–C covalent bond by photoanodic reaction with C18H37MgCl in THF solution. The formation of the organic monolayer was confirmed by attenuated total reflection (ATR) FT-IR spectroscopy. This process was applied to a one-step patterning of an organic monolayer on a H–Si(1 1 1) by illuminating the H–Si(1 1 1) electrode through photomask in a C18H37MgCl/THF solution at positive potential. The formation of the pattern reflecting the shape of the photomask was confirmed by SEM observations.

• Elsevierの論文
• 2007-01-15

著者

• 高草木 達

  東京大学大学院理学系化学専攻

• Takakusagi Satoru

  Physical Chemistry Lab. Div. Of Chemistry Graduate School Of Sci. Hokkaido Univ. Sapporo 060-0810 Jp

• Takakusagi Satoru

  Physical Chemistry Laboratory Division Of Chemistry Graduate School Of Science Hokkaido University

• Uosaki K

  Hokkaido Univ. Sapporo

• Uosaki Kohei

  Physical Chemistry Laboratory Division Of Chemistry Graduate School Of Science Hokkaido University

• Uosaki Kohei

  Phyical Chemistry Laboratory Division Of Chemistry Graduate School Of Science Hokkaido University

• Umakoshi Keisuke

  Department Of Applied Chemistry Faculty Of Engineering Nagasaki University

• Uosaki Kohei

  Physical Chemistry Laboratory Department Of Chemistry Faculty Of Science Hokkaido University

• 高草木 達

  北海道大学触媒化学研究センター表面構造化学研究部門・構造制御反応場クラスター

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