Photopatterning of an Organic Monolayer Formed on a Si Single Crystal Surface via Si–C Covalent Bond by UV Irradiation in an Inert Atmosphere
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概要
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We demonstrate that photopatterning of an octadecyl monolayer, which was covalently attached to a Si(111) surface via Si–C bond [C18H37–Si(111)], is possible just by irradiating the monolayer surface with UV light ($254\,\text{nm}+185\,\text{nm}$) in an atmospheric Ar environment through Cu microgrid patterns. The grid patterns were successfully transferred to the surface without detectable damage in the non-irradiated region. The patterned monolayer was further used as a template for metal pattern formation by electroless Cu deposition. The organic monolayer effectively worked as an efficient insulating mask for the electroless deposition of Cu, which was selectively deposited on the UV irradiated region. This approach is simple and convenient for fabricating microstructures of various molecules and metals on a Si surface.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-11-15
著者
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Takakusagi Satoru
Physical Chemistry Lab. Div. Of Chemistry Graduate School Of Sci. Hokkaido Univ. Sapporo 060-0810 Jp
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Uosaki Kohei
Physical Chemistry Laboratory Department Of Chemistry Faculty Of Science Hokkaido University
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Takakusagi Satoru
Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido University, Sapporo 060-0810, Japan
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Uosaki Kohei
Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido University, Sapporo 060-0810, Japan
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