大気圧マイクロプラズマのプロセス化に関する研究

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Electron temperature(Te)and electron density(ne)are most important parameters of plasma,respectively.However,increasing pressure around plasma,theoretical diagnostic will not fit for actual phenomenon because of electron-heavy particle and heavy particle-heavy particle collision frequencies rising.The UV and visible optical emission spectroscopy(OES)applied for theoretical diagnostics toward He-plasma in the atmosphere.Relative emission line intensities of neutral helium are estimated for the principal quantum number n=3 to 2 transitions. The population density was calculated from comparison of the 6 spectrum with defined excitation temperature(Tex)in internal partition function to estimate Te from Tex.The other method is based on Collisional-Radiative model(CR model)to calculate Te and ne.Moreover,we gained gas temperature(Tg)from OH・(306.4[nm])emission line.In the result,ne=1×1011[cm-3],Te=1.8-2.4[eV]and Tg=400-550[K]on various apparatus conditions.And we tested utilizing the atmospheric micro-plasma in deposition process to make TiO2 film from TiO2 powder.A way to check TiO2 film,we adopted observation of surface on TiO2 film by SEM.Experimental conditions at process were RF power=10[W],torch-base distance=1[mm]and processing time=5[min].In the result,transparent films were gained on optional position.The present consequences,demonstrated us possibility of adopting atmospheric micro-plasma in plasma process.
2010-03-01