Current Transport Characteristics for Organic Nonvolatile Memories(Session5A: Si Devices II)
スポンサーリンク
概要
- 論文の詳細を見る
Recently, organic nonvolatile memory has attracted much interest as a candidate device for next generation nonvolatile memory because of its simple process, small device area, and high speed. So, next generation nonvolatile memory is studied actively in many industrial and academic labs. However, results of many research groups announce differed, and anyone did not reveal correct current transport mechanism. We confirmed following results through continuous research. An organic memory cell fabricated with embedded metal nanocrystals in a layer of small molecules or a polymer layer could only show nonvolatile memory behavior of the organic memory type with I-V characteristic of negative differential resistance and a current path of the high-resistance, low-resistance, high-resistance, and high-resistance states when the applied bias was swept from program and erase at a positive voltage followed by program and erase at a negative voltage. On the other hand, organic devices fabricated without embedded metal nanocrystals could show only resistance behavior or nonvolatile memory behavior based on resistive random-access-memory with a current path of the low-resistance, high-resistance, high-resistance, and low-resistance states when the applied bias was swept as above. Moreover, as analyzing I-V characteristics of organic memory cells in relation to current conduction mechanism and temperature dependency of current, we aimed to find out current transport mechanism that contribute to show actually nonvolatile memory characteristics of organic memory cells.
- 社団法人電子情報通信学会の論文
- 2008-07-02
著者
-
Park Jea-Gun
National Program Center for Tera-bit-level Nonvolatile Memory Development, Dept. of Electrical and C
-
Oh Young-hwan
National Program Center For Terabit-level Nonvolatile Memory Development Hanyang University
-
Nam Woo-Sik
National Program Center for Terabit-level Nonvolatile Memory Development, HIT 101 Hanyang University
-
Lee Gon-Sub
National Program Center for Terabit-level Nonvolatile Memory Development, HIT 101 Hanyang University
-
Seo Sung-Ho
National Program Center for Terabit-level Nonvolatile Memory Development, HIT 101 Hanyang University
-
Park Jea-gun
National Program Center For Terabit-level Nonvolatile Memory Development Hanyang University
-
Park Jea-gun
National Program Center For Tera-bit-level Nonvolatile Memory Development Dept. Of Electrical And Co
-
Seo Sung-ho
National Program Center For Terabit-level Nonvolatile Memory Development Hanyang University
-
Lee Gon-sub
National Program Center For Terabit-level Nonvolatile Memory Development Hanyang University
-
Nam Woo-sik
National Program Center For Terabit-level Nonvolatile Memory Development Hanyang University
-
Nam Woo-sik
National Program Center For Tera-bit-level Nonvolatile Memory Development Department Of Electronics
-
Park Jea-gun
National Program Center For Tera-bit-level Nonvolatile Memory Development Department Of Electronics
関連論文
- Dependence of Ag film thickness on Formation of Ag Nano-crystals to Fabricate Polymer Nonvolatile Memory(Session 2A : Memory 1)
- Non-volatile Memory Fabricated with Al Nanocrystals Embedded in Conductive-Low-Molecular-Organic Layers(Session 3 Emerging Devices and Technologies I,AWAD2006)
- Non-volatile Memory Fabricated with Al Nanocrystals Embedded in Conductive-Low-Molecular-Organic Layers(Session 3 Emerging Devices and Technologies I,AWAD2006)
- Dependence of Ag film thickness on Formation of Ag Nano-crystals to Fabricate Polymer Nonvolatile Memory(Session 2A : Memory 1)
- Current Transport Characteristics for Organic Nonvolatile Memories(Session5A: Si Devices II)
- Current Transport Characteristics for Organic Nonvolatile Memories(Session5A: Si Devices II)
- Dependence of Ag Film Thickness on Ag Nanocrystals Formation to Fabricate Polymer Nonvolatile Memory
- Small-Molecule Nonvolatile Memory Cells Embedded with Ti Nanocrystals Surrounded by TiO_2 Tunneling Barrier
- Erratum: ``Small-Molecule Nonvolatile Memory Cells Embedded with Ti Nanocrystals Surrounded by TiO2 Tunneling Barrier''