Characteristics of the Linewdth Variation due to Flare and Its Dependency on Optical Parameters

スポンサーリンク

概要

著者

関連論文

Flare in Microlithographic Exposure Tools
Influence of Defect Segregation on the Electrical Properties of Nb-doped SrTiO_3 Grain Boundary Layer
A New, Low-Thermal-Budget Planarization Scheme for Pre-Metal Dielectric Using Electron-Beam Cured Hydrogen Silsesquioxane in Device
A Novel and Low Thermal Budget Planarization Scheme for Pre-Metal Dielectric Using Electron-Beam Cured HSQ (Hydrogen Silsesquioxane) in STC (Stacked Capacitor) DRAM
Process Technology for Next Generation Photomask
Characteristics of the Linewdth Variation due to Flare and Its Dependency on Optical Parameters
Influence of Grain boundary Layers on the Dielectric Relaxation of Nb-Doped SrTiO_3
Which Mask is Preferred for Sub-60 nm Node Imaging?

スポンサーリンク