Process Technology for Next Generation Photomask
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-30
著者
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CHOI Sung-Woon
Photomask Team, Samsung Electronic Co., Ltd.
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Choi S‐w
Samsung Electronics Co. Ltd. Yongin Kor
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Cha B‐c
Hanyang Univ. Kyunggido Kor
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SOHN Jung-Min
Photomask Group, R&D Center, Samsung Electronics
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KIM Byung-Gook
Photomask Group, R&D Center, Samsung Electronics
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KIM Jin-Min
Photomask Group, R&D Center, Samsung Electronics
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CHA Byung-Cheol
Photomask Group, R&D Center, Samsung Electronics
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YOON Hee-Sun
Photomask Group, R&D Center, Samsung Electronics
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Sohn J‐m
Samsung Electronics Co. Ltd. Yongin Kor
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Kim Jin-min
Photomask Group R&d Center Samsung Electronics
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Yoon Hee-sun
Photomask Group R&d Center Samsung Electronics
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Kim Byung-gook
Photomask Group R&d Center Samsung Electronics
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Choi Sung-woon
Photomask Group R&d Center Samsung Electronics
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Cha Byung-cheol
Photomask Group R&d Center Samsung Electronics
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Sohn Jung-Min
Photomask Group, R&D Center, Samsung Electronics
関連論文
- Flare in Microlithographic Exposure Tools
- Process Technology for Next Generation Photomask
- Characteristics of the Linewdth Variation due to Flare and Its Dependency on Optical Parameters