Morphological Stability of TiO_2 Thin Films With Isolated Columns : Surfaces, Interfaces, and Films
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概要
- 論文の詳細を見る
We have investigated the stability of the morphologies of obliquely deposited TiO_2 thin films against annealing and humidity. For the thin films with closely distributed columns, the thickness decreases by more than 10% by annealing at 500℃, and the columnar structure is destroyed by exposure to hot water vapor. However, the thin films with isolated columns show no significant change in the thickness and morphology. This can be understood in terms of the stress induced in the thin films with columns which are in contact or isolated. The stable morphologies of the thin films with isolated columns and their shape-related functions are useful for devices that require thermal processing and those used under humid conditions.
- 社団法人応用物理学会の論文
- 2001-04-15
著者
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Ito Tadayoshi
Toyota Central Research And Development Laboratories Inc.
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Taga Yasunori
Toyota Central R & D Laboratories Inc.
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Suzuki Motofumi
Toyota Central Research & Development Laboratories
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