Force Driving Cu Diffusion into Interlayer Dielectrics : Semiconductors

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-05-15

著者

• Matsuura Azuma

  Association Of Super-advanced Electronics Technologies (aset)

• FUKUDA Takuya

  Association of Super-Advanced Electronics Technologies (ASET)

• NISHINO Hirotaka

  Association of Super-Advanced Electronics Technologies (ASET)

• MATSUNAGA Hironori

  Association of Super-Advanced Electronics Technologies (ASET)

関連論文

• Analysis of Leakage Current of Low-k Materials for Use as Interlayer Dielectric
• Force Driving Cu Diffusion into Interlayer Dielectrics : Semiconductors
• Novel Method of Estimating Dielectric Constant for Low-k Materials: Semiconductors
• Analysis of Leakage Current of Low-k Materials for Use as Interlayer Dielectric
• Low Dielectric Constant Film Containing No Oxygen for Barrier-Free Cu Interconnects
• A Novel Method of Removing Impurities from Multilevel Interconnect Materials

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