Surface Morphology of Growing Al on Si(111)7×7 and Si(111)√<3>×√<3>-Al Substrates by Reflection High-Energy Electron Diffraction
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-07-30
著者
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Horio Yoshimi
Department of Applied Electronics, Daido Institute of Technology
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Horio Yoshimi
Department Of Applied Electronics Daido Institute Of Technology
関連論文
- Different Growth Modes of Al on Si(111)7×7 and Si(111)√×√ -Al Surfaces
- Behaviors of Auger Intensities Emitted from a Si(111)〔ルート3〕×〔ルート3〕-Al Surface During Incident Beam Rocking of Reflection High-Energy Electron Diffraction
- Observation of Vicinal Si(111)7×7 Surface by Energy-Filtered Reflection High-Energy Electron Diffraction
- Development of Energy-Filtered Reflection High-Energy Electron Diffraction Apparatus
- Zero-Loss Reflection High-Energy Electron Diffraction Patterns and Rocking Curves of the Si(111)7×7 Surface Obtained by Energy Filtering
- Phase Shift and Frequency Doubling on Intensity Oscillations of Reflection High-Energy Electron Diffraction : One-Beam Dynamical Calculations for Ge on Ge(111) Surface
- Surface Morphology of Growing Al on Si(111)7×7 and Si(111)√×√-Al Substrates by Reflection High-Energy Electron Diffraction
- Temperature Dependence of Oxygen Diffusion and Crystal Structure for Thermally Oxidized Titanium Thin Films
- Auger Intensity from Si(001)$2{\times}2$–Al Surface Excited by Wave-Field in Medium-Energy Electron Diffraction
- Dimer Configuration of Si(001)2×1 Surface by Projected Potential Approach of Reflection High-Energy Electron Diffraction