Quality and Power Efficient Architecture for the Discrete Cosine Transform(VLSI Architecture, <Special Section>VLSI Design and CAD Algorithms)
スポンサーリンク
概要
- 論文の詳細を見る
In recent years, the demand for multimedia mobile battery-operated devices has created a need for low power implementation of video compression. Many compression standards require the discrete cosine transform (DCT) function to perform image/video compression. For this reason, low power DCT design has become more and more important in today's image/video processing. This paper presents a new power-efficient Hybrid DCT architecture which combines Loeffler DCT and binDCT in terms of special property on luminance and chrominance difference. We use Synopsys PrimePower to estimate the power consumption in a TSMC 0.25-μm technology. Besides, we also adopt a novel quality assessment method based on structural distortion measurement to measure the quality instead of peak signal to noise rations (PSNR) and mean squared error (MSE). It is concluded that our Hybrid DCT offers similar quality performance to the Loeffler, and leads to 25% power consumption and 27% chip area savings.
- 2005-12-01
著者
-
Ruan Shanq
Department Of Electronic Engineering National Taiwan University Of Science And Technology
-
Lin Bo
Department Of Electronic Engineering National Taiwan University Of Science And Technology
-
Lin Bo
Department Of Electronic Engineering National Chiao Tung University
-
Shie Mon
Department Of Electronic Engineering National Taiwan University Of Science And Technology
-
SUNG Chi
Department of Electronic Engineering, National Taiwan University of Science and Technology
-
Sung Chi
Department Of Electronic Engineering National Taiwan University Of Science And Technology
関連論文
- Quality and Power Efficient Architecture for the Discrete Cosine Transform(VLSI Architecture, VLSI Design and CAD Algorithms)
- Improved Retention Characteristic in Polycrystalline Silicon--Oxide--Hafnium Oxide--Oxide--Silicon-Type Nonvolatile Memory with Robust Tunnel Oxynitride
- Deuterium Effect on Stress-Induced Leakage Current
- Robust Ultrathin Oxynitride with High Nitrogen Diffusion Barrier near its Surface Formed by NH3 Nitridation of Chemical Oxide and Reoxidation with O2
- Reoxidation Behavior of High-Nitrogen Oxynitride Films after O2 and N2O Treatment