Electrochromic IrO_x Thin Films Formed in Sulfatoiridate (III, IV) Complex Solution by Periodic Reverse Current Electrolysis (PRIROF)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1987-09-20

著者

• BABA Nobuyoshi

  Faculty of Technology, Tokyo Metropolitan University

• Arai K

  Electrotechnical Laboratory

• YOSHINO Takako

  Faculty of Technology, Tokyo Metropolitan University

• ARAI Kenji

  Faculty of Technology, Tokyo Metropolitan University

• Baba Nobuyoshi

  Faculty Of Technology Tokyo Metropolitan University

• Yoshino Takako

  Faculty Of Technology Tokyo Metropolitan University

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• Electrochromic IrO_x Thin Films Formed in Sulfatoiridate (III, IV) Complex Solution by Periodic Reverse Current Electrolysis (PRIROF)
• 10-nm-Scale Pattern Delineation Using Calixarene Electron Beam Resist for Complementary Metal Oxide Semiconductor Gate Etching
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