Implementation of Sub-150 nm Contact Hole Pattern by Resist Flow Process
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-30
著者
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Baik Ki-ho
Hyundai Electronics Induestries.
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KIM Jin-Soo
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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CHOI Chang-Il
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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KIM Myoung-Soo
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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BOK Cheol-Kyu
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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KIM Hyeong-Soo
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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金 炯秀
Hyundai Electronics Induestries.
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BAIK KN-Ho
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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Kim Hyoung-Gi
Hyundai Electronics Induestries.
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Kim Myoung-Soo
Hyundai Electronics Induestries.
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Bok Cheol-Kyu
Hyundai Electronics Induestries.
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Kim Jin-soo
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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Choi Chang-il
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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金 炯秀
Hyundai Electronics Induestries
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Kim Hyeong-soo
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
関連論文
- TSI工程によるアイソレイシン構造の具現
- Implementation of Sub-150 nm Contact Hole Pattern by Resist Flow Process
- TSI工程によるアイソレイシン構造の具現
- Limitation for contact hole windows in an attenuated phase shift mask with i-line lithography
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist