Polyvinyl Alcohol Film Coating Effect on Novolac-Based Positive Electron Resist Sensitivity in X-Ray Lithography in an Atmospheric Environment

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概要

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• The polyvinyl alcohol (PVA) film coating effect on novolac-based positive electron resist (NPR) has been studied in X-ray lithography using a Si X-ray source in an atmospheric environment. Extremely striking deterioration in NPR sensitivity was observed in an atmospheric environment compared with in vaccum. It was also found that the sensitivity deterioration was to a greater extent improved by using the PVA/NPR scheme.

• 社団法人応用物理学会の論文
• 1985-07-20

著者

• Matsui Junji

  Microelectronics Research Laboratories Nec Corporation

• Ohfuji Takeshi

  Vlsi Development Division Nec Corporation

• OKADA Koichi

  Microelectronics Research Laboratories, NEC Corporation

• Okada Koichi

  Microelectronics Research Laboratories Nec Corporation

関連論文

• Effects of Electrons Ejected from the Substrate on PGMA Negative Resist Cross-Linking in X-Ray Lithography
• Polyvinyl Alcohol Film Coating Effect on Novolac-Based Positive Electron Resist Sensitivity in X-Ray Lithography in an Atmospheric Environment
• In-Situ Thermographical Temperature Measurement of Be Windows Irradiated by Synchrotron Radiation : Techniques, Instrumentations and Measurement
• Study of Exposure Atmosphere Effect on PGMA Negative Resist Cross-Linking in X-Ray Lithography Using 1-3 keV Soft X-Ray Sources

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