Okada Koichi | Microelectronics Research Laboratories Nec Corporation
スポンサーリンク
概要
関連著者
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Okada Koichi
Microelectronics Research Laboratories Nec Corporation
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Matsui Junji
Microelectronics Research Laboratories Nec Corporation
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OKADA Koichi
Microelectronics Research Laboratories, NEC Corporation
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Ohfuji Takeshi
Vlsi Development Division Nec Corporation
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Fujii Kiyoshi
Microelectronics Research Laboratories Nec Corporation
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Matsui Junichi
Microelectronics Research Laboratories Nec Corporation
著作論文
- Effects of Electrons Ejected from the Substrate on PGMA Negative Resist Cross-Linking in X-Ray Lithography
- Polyvinyl Alcohol Film Coating Effect on Novolac-Based Positive Electron Resist Sensitivity in X-Ray Lithography in an Atmospheric Environment
- In-Situ Thermographical Temperature Measurement of Be Windows Irradiated by Synchrotron Radiation : Techniques, Instrumentations and Measurement
- Study of Exposure Atmosphere Effect on PGMA Negative Resist Cross-Linking in X-Ray Lithography Using 1-3 keV Soft X-Ray Sources