Hall Effect Measurements on Fine-Grain Poy-Si Thin-Film Transistors Made from Laser-Irradiated Sputter-Deposited Si Film

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-02-01

著者

• Okamoto Akihiko

  Microelectronic Laboratories

• Suyama Shiro

  Ntt Affiliated Business Development Headquarters

• Serikawa Tadashi

  NTT Applied Electronics Laboratories

• Shirai Seiiti

  NTT Applied Electronics Laboratories

• Okamoto Akio

  NTT Applied Electronics Laboratories

• Suyama Shiro

  Ntt Applied Electronics Laboratories

関連論文

• Evaluation of the Fusional Limit between the Front and Rear Images in Depth-Fused 3-D Visual Illusion (Electronic Displays)
• Three-Dimensional Display System with Dual-Frequency Liquid-Crystal Varifocal Lens
• A New 3-D Display Method Using 3-D Visual Illusion Produced by Overlapping Two Luminance Division Displays(Electronic Displays)
• Hall Effect Measurements on Fine-Grain Poy-Si Thin-Film Transistors Made from Laser-Irradiated Sputter-Deposited Si Film
• Electrical Characteristics of High-Mobility Fine-Grain Poly-Si TFTs from Laser Irradiated Sputter-Deposited Si Film
• Uniform Epitaxial Growth of Modulation-Doped GaAs/Ga_Al_As on Three-Inch Substrate by Metalorganic Chemical Vapor Deposition
• Field-Induction-Drain Thin-Film Transistors for Liquid-Crystal Display Applications : Liquid Crystal Display
• Field-Induction-Drain Thin-Film Transistors for Liquid-Crystal Display Applications
• Recessed-Gate Doped-Channel Hetero-MISFETs (DMTs) for High-Speed Laser Driver IC Application (Special Issue on Microwave and Millimeter-Wave Technology for Advanced Functioions and Size-Reductions)
• New Resonant Tunneling Diode with a Deep Quantum-Well

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