Thickness Dependence of Infrared Reflection Absorption in Vacuum-Deposited Thin Film of Polyvinylidene Fluoride
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概要
- 論文の詳細を見る
Reflection absorption intensities for p-polarized infrared rays are shown as a function of thickness (d) of vacuum-deposited films of polyvinylidene fluoride (PVDF), which were deposited on Ag-covered mica substrates held at 25℃. Each absorption due to α-type polycrystalline film at 1412, 1215, 1185, 1150, 1070, 875 and 615 cm^<-1> increases linearly with increasing d. Some structural relaxation during the growth of PVDF film is discussed for interpretation of the result that absorption at 1215, 1185 and 875 cm ' is not observed and the peak height at 882 cm^<-1> is seen clearly for films at d<15 nm.
- 社団法人応用物理学会の論文
- 1990-06-20
著者
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Maki Kunisuke
Department Of Physics Yokohama City University:graduate School Of Integrated Science Yokohama City U
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Maki Kunisuke
Department Of Physics & Graduate School Of Integrated Science Yokohama City University
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Kikuma Kazuhiro
Graduate School Of Integrated Science Yokohama City University
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TERASHIMA Hidenobu
Department of Physics, Yokohama City University
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Terashima Hidenobu
Department Of Physics Yokohama City University
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