Crystallization Thickness of Amorphous Sb Film on GeO_x Film Substrate in a Vacuum of 10^<-5> Torr

概要

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Antimony films with thicknesses smaller than a critical value, deposited at room temperature, are composed of amorphous islands. Amorphous Sb film on GeO_x film substrate starts to crystallize spontaneously when the fractional area occupied by Sb exceeds 70-80% in the vicinity of the critical thickness, here called the crystallization thickness d_c. The value of d_c is increased by exposing GeO_x to air before evaporating the Sb; it is 60-80Å for as-deposited GeO_x but 100-120Å for that exposed to air. This is because the compound islands on as-deposited GeO_x cannot contract as easily as those on GeO_x exposed to air after the coalescence of islands with neighbouring ones to form a continuous film.
社団法人応用物理学会の論文
1980-11-05