Cold and Low-Energy Ion Etching(COLLIE) : Etching and Deposition Technology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-12-30
著者
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FUJIWARA Nobuo
LSI Research and Development Labotary, Mitsubishi Electric Corporation
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NISHIOKA Kyusaku
LSI Research and Development Labotary, Mitsubishi Electric Corporation
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Fujiwara Nobuo
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
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Nishioka Kyusaku
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
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Kato Tadao
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
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Shibano Teruo
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
関連論文
- Highly Selective AlSiCu Etching Using BBr_3 Mixed-Gas Plasma : Etching and Deposition Technology
- ECR Plasma Etching with Heavy Halogen Ions : Etching and Deposition Technology
- Highly Selective AlSiCu Etching Using BBr_3 Mixed-Gas Plasma
- ECR Plasma Etching with Heavy Halogen Ions
- Characterization of Silicon Implanted with Focused Ion Beam by Raman Microprobe
- Cold and Low-Energy Ion Etching(COLLIE) : Etching and Deposition Technology
- Reactive Ion Beam Etching Using a Selective Gallium Doping Method
- Cold and Low-Energy Ion Etching (COLLIE)