Annealing Behavior of Light Scattering Tomography Defect in the Denuded Zone of Si Wafers
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-03-15
著者
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Kida Michio
R&d Center Mitsubishi Materials Silicon Corporation
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FURUKAWA Jun
R&D Center, Mitsubishi Materials Silicon Corporation
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KIDA Michio
R&D Center, Mitsubishi Materials Silicon Corporation
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SHIMANUKI Yasushi
R&D Center, Mitsubishi Materials Silicon Corporation
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Shimanuki Yasushi
Central Research Institute Mitsubishi Metal Corporation
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Shimanuki Yasushi
R&d Center Mitsubishi Materials Silicon Corporation
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Furukawa Jun
R&d Center Mitsubishi Materials Silicon Corporation
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FURUKAWA Jun
R&D Center, Mitsubishi Materials Silicon Corporation
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KIDA Michio
R&D Center, Mitsubishi Materials Silicon Corporation
関連論文
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- Observation of Wet Biological Specimen by Soft X-Ray Microscope with Zone Plates at UVSOR
- Crystal-Originated Singularities on Si Wafer Surface after SCl Cleaning
- Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence
- Annealing Behavior of Light Scattering Tomography Defect in the Denuded Zone of Si Wafers
- Effects of Thermal History on Microdefect Formation in Czochralski Silicon Crystals