Rate Determing Step of Anodic Charge-Transfer Process during Porous Silicon Formation in HF Solution

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概要

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• Anodic reactions for the formation of porous silicon have been examined with regard to the rate determining step of charge-transfer processes. Porous silicon is formed by local silicon dissolution along with both divalent and tetravalent ions. The divalent anodic reaction based on Lehmann's model is controlled by activation. For the charge-transfer process of the divalent reaction, the second charge transfer step acts as the rate determining step. On increasing the anodic current density, the anode characteristics do not obey Tafel's law. In this region, the influence of the mass transfer process appears. For the case of dilute HF solution, the mass transfer process is entirely the rate determing step of the anodic silicon dissolution reaction.

• 社団法人応用物理学会の論文
• 1997-09-15

著者

• Unagami T

  Faculty Of Science And Engineering Teikyo University

• Unagami Takashi

  Faculty Of Science And Engineering Teikyo University

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• Rate Determing Step of Anodic Charge-Transfer Process during Porous Silicon Formation in HF Solution
• Silicon Thin Film with Columnar Structure Formed by RF Diode Sputtering

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