Evaluation of Large-Area Mo/Si Multilayer Soft X-Ray Mirrors Fabricated by RF Magnetron Sputtering

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-09-15

著者

• KAWAMURA Tomoaki

  NTT Interdisciplinary Research Laboratories

• TAKENAKA Hisataka

  NTT Interdisciplinary Research Laboratories

• Ishii Yoshikazu

  Ntt Interdisciplinary Research Laboratories

• KINOSHITA Hiroo

  NTT LSI Laboratories

• Haga Tsuneyuki

  Ntt Lsi Laboratories

関連論文

• X-Ray Standing Wave Analysis of GaAs/Si Interface
• X-Ray Standing Wave Analysis of Al/GaAs/Si(111)
• An Electron Beam Nanolithography System and its Application to Si Nanofabrication
• Soft X-Ray Reduction Lithography Using Multilayer Mirrors : X-Ray Lithography
• Soft X-Ray Reduction Lithography Using Multilayer Mirrors
• Evaluation of Large-Area Mo/Si Multilayer Soft X-Ray Mirrors Fabricated by RF Magnetron Sputtering
• Independent Characterization of Density and Interface Roughness of Multilayers Using X-Ray Standing Waves
• Assembly of Extreme Ultraviolet Lithography Optics Using At-Wavelength Foucault Testing

スポンサーリンク