Assembly of Extreme Ultraviolet Lithography Optics Using At-Wavelength Foucault Testing

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概要

• 論文の詳細を見る

• An on-line, at-wavelength, Foucault testing system has been developed to assemble the imaging optics for extreme ultraviolet lithography (EUVL). The relationship between Foucaultgrams and assembly errors was analyzed through the computer calculation of Foucaultgrams for each type of assembly error based on both a ray-tracing and a numerical approach. In addition, the assembly tolerance was estimated by calculating both the modulation transfer function (MTF) and the wave-front error (WFE) for diffraction-limited imaging performance. The calculated results indicate that a Foucault testing method is sufficiently sensitive to the various types of assembly error to enable the diffraction-limited imaging performance to be achieved.

• 社団法人応用物理学会の論文
• 1996-12-30

著者

• Haga Tsuneyuki

  Ntt Lsi Laboratories

• TINONE C.K.

  NTT LSI Laboratories

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• Evaluation of Large-Area Mo/Si Multilayer Soft X-Ray Mirrors Fabricated by RF Magnetron Sputtering
• Assembly of Extreme Ultraviolet Lithography Optics Using At-Wavelength Foucault Testing

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