Charge Build-Up and Uniformity Control in Magnetically Enhanced Reactive Ion Etching Using a Curved Lateral Magnetic Field

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概要

• 論文の詳細を見る

• The effectiveness of a curved lateral magnetic field has been examined in magnetically enhanced reactive ion etching (MERIE). It is demonstrated that both charge build-up and etching nonuniformity are suppressed at the same time when the offset angle of dipole magnets is adjusted to 10℃. Theoretical analysis of electron flow in the curved lateral magnetic field suggests that the plasma electron multiplication effect along E×B drift motion is compensated by the divergence of the drift motion at the optimum condition, and it results in uniform plasma generation. Although the definite mechanism of charge build-up is still not clear, this study indicates the importance of plasma uniformity in controlling the charge build-up in a MERIE system.

• 社団法人応用物理学会の論文
• 1994-04-30

著者

• NAMURA Takashi

  Kyoto Research Lab., Matsushita Electronics Corp.

• Namura Takashi

  Kyoto Research Laboratory Matsushita Electronics Corporation

• Mori Hajime

  Memory Division Matsushita Electronics Corporation

• Sasaki Tomoyuki

  Kyoto Research Laboratory Matsushita Electronics Corporation

• NAKAGAWA Satoshi

  Kyoto Research Laboratory, Matsushita Electronics Corporation

• Nakagawa Satoshi

  Kyoto Research Laboratory Matsushita Electronics Corporation

関連論文

• Evaluation of Device Charging in Ion Implantation : Ion Beam Process
• Evaluation of Device Charging in Ion Implantation
• Quantitative Charge Build-Up Evaluation Technique by Using MOS Capacitors with Charge Collecting Electrodes in Wafer Processing (Special Issue on Microelectronic Test Structure)
• Charge Buildup in Magnetized Process Plasma
• Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher : Etching and Deposition Technology
• Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher
• Epitaxial Lateral Overgrowth (ELO) of Silicon on the Whole Surface
• Charge Build-Up and Uniformity Control in Magnetically Enhanced Reactive Ion Etching Using a Curved Lateral Magnetic Field

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