Double-Pulse Operation in XeCl Excimer Laser for Simulation of High-Repetition-Rate Performance

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概要

• 論文の詳細を見る

• In order to simulate laser performance at high-repetition rates, sequential discharge pulses (double pulse) were generated in a XeCl laser gas mixture. Various aspects of the discharges and the laser power of the second pulse were observed, while varying the pulse interval from 1 s to 1 ms. With shortening of the interval, some white streamers first appeared in the glow discharge which finally changed into a high-intensity red arc. In the discharge transition from glow to arc, the laser pulse width was reduced first, followed by peak intensity decrease. The arc-onset pulse interval, T_<th>, was investigated at gas flow rates from 0 m/s to 6.2 m/s. The values of 1/T_<th> almost coincide with the laser repetition rate at which the average power begins to diminish under continuous operation. Double-pulse operation is an effective means to estimate the upper limits of the laser repetition rate.

• 社団法人応用物理学会の論文
• 1990-06-20

著者

• Okamoto N

  Fujitsu Lab. Ltd. Atsugi Jpn

• Goto Tatsumi

  Toshiba Corporation Manufacturing Engineering Laboratory

• TAKAGI Shigeyuki

  TOSHIBA Corporation Manufacturing Engineering Laboratory

• OKAMOTO Noboru

  TOSHIBA Corporation Manufacturing Engineering Laboratory

• SATO Saburo

  TOSHIBA Corporation Manufacturing Engineering Laboratory

• Takagi Shigeyuki

  Toshiba Corporation

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• Double-Pulse Operation in XeCl Excimer Laser for Simulation of High-Repetition-Rate Performance
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