Analysis of Effective Channel Length in Amorphous Silicon Thin-Film Transistors
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概要
- 論文の詳細を見る
This paper analyzes the effective channel length in amorphous silicon thin-film transistors (a-Si TFTs) by examining the parasitic channel length, ?L, which causes the apparent dependence of the field-effect mobility of TFTs on the nominal channel length. The parasitic channel length is found to depend on the a-Si thickness, L_a, at the source path and the drain path of TFTs if there is no etching stopper insulator on the a-Si layer. An analytical formula for the parasitic channel length is derived by assuming that the space-charge-limited current is the dominant conduction mechanism through these paths. The validity of the analysis is confirmed by applying the formula to the experimental results on the ?L-L_a relationship for a range of L_a between 0.18 and 0.98 μm.
- 社団法人応用物理学会の論文
- 1992-11-15
著者
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Kaneko Yoshiyuki
Central Research Laboratory Hitachi Lid.
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Kaneko Yoshiyuki
Central Research Laboratory Hitachi Ltd.
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Toyabe Tooru
Department Of Information And Computer Science Toyo University:bio-nano Electronics Research Center
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TSUKADA Toshihisa
Central Research Laboratory, Hitachi, Lid.
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TOYABE Tooru
Central Research Laboratory, Hitachi, Ltd.
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Tsukada Toshihisa
Central Research Laboratory Hitachi Ltd.
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Tsukada Toshihisa
Central Research Laboratory Hitachi Lid.
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