Formation of Dielectric Films for Gap-Filling by NH_3-Added H_2O-Tetraethoxysilane Plasma Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-12-30
著者
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Satoh J
Mos Development Center Sony Nagasaki Corporation
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SATO Jun-ichi
MOS Development Center, SONY Nagasaki Corporation
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Muroyama M
Sony Corp. Atsugi Jpn
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Muroyama Masakazu
Process Technology Department Ulsi R&d Group Sony Corporation
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Muroyama Masakazu
Ulsi R & D Laboratories Sony Corporarion Atsugi Technology Center
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SATO Jun-ichi
ULSI R & D Laboratories, SONY Corporarion, Atsugi Technology Center
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KAWASHIMA Atsushi
ULSI R & D Laboratories, Sony Corporation
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Sato J
Hitachi Cable Ltd.
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Satoh J
Laboratory Of Animal Nutrition School Of Agriculture Ibaraki University
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Kawashima Atsushi
Ulsi R & D Laboratories Sony Corporation
関連論文
- Morphology Control of Films Formed by Atmospheric-Pressure Chemical Vapor Deposition Using Tetraethylorthosilicate/Ozone System
- Chemical Vapor Deposition of Anti-Reflective Layer Film for Excimer Laser Lithography
- Precursors in Atmospheric-Pressure Chemical Vapor Deposition of Silica Films from Tetraethylorthosilicate/Ozone System
- Particle Generation and Film Formation in an Atmospheric-Pressure Chemical Vapor Deposition Reactor Using the Tetraethylorthosilicate (TEOS)/He, TEOS/O_2/He, and TEOS/O_3/He Systems
- Gas-Phase Nucleation in an Atmospheric Pressure Chemical Vapor Deposition Process for SiO_2 Films Using Tetraethylorthosilicate (TEOS)
- Formation of Dielectric Films for Gap-Filling by NH_3-Added H_2O-Tetraethoxysilane Plasma Chemical Vapor Deposition
- Formation of Thermally Stable Multilayered BSCCO Films with 2223, 2234 and 2245 Structures
- Synthesis of Artificially Layered Bi-Sr-Ca-Cu Oxide Films and Their Thermal Stability
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