Chemical Vapor Deposition of Anti-Reflective Layer Film for Excimer Laser Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-01-30
著者
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Muroyama Masakazu
Ulsi R & D Laboratories Sony Corporarion Atsugi Technology Center
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GOCHO Tetsuo
ULSI R & D Laboratories, SONY Corporarion, Atsugi Technology Center
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OGAWA Tohru
ULSI R & D Laboratories, SONY Corporarion, Atsugi Technology Center
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SATO Jun-ichi
ULSI R & D Laboratories, SONY Corporarion, Atsugi Technology Center
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Ogawa Tohru
Ulsi R & D Laboratories Sony Corporarion Atsugi Technology Center
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Sato Jun-ichi
Ulsi R & D Laboratories Sony Corporarion Atsugi Technology Center
関連論文
- Chemical Vapor Deposition of Anti-Reflective Layer Film for Excimer Laser Lithography
- Formation of Dielectric Films for Gap-Filling by NH_3-Added H_2O-Tetraethoxysilane Plasma Chemical Vapor Deposition
- New Systematic Evaluation Method for Attenuated Phase-Shifting Mask Specifications
- Advantages of a SiO_xN_y:H Anti-Reflective Layer for ArF Excimer Laser Lithography
- Hydrogenated Silicon-Oxynitride Film Antireflective Layer for Optical Lithography