Mechanical Response of X-Ray Masks
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-12-30
著者
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Laird Daniel
Center For X-ray Lithography University Of Wisconsin-madison
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LAUDON Matthew
Center for X-ray Lithography University of Wisconsin-Madison
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ENGELSTAD Roxann
Center for X-ray Lithography University of Wisconsin-Madison
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CERRINA Franco
Center for X-ray Lithography University of Wisconsin-Madison
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Cerrina F
Univ. Wisconsin‐madison Wi Usa
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Cerrina Franco
Center For Nanotechnology University Of Wisconsin-madison
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Engelstad R
Univ. Wisconsin‐madison Wisconsin Usa
関連論文
- Mechanical Response of X-Ray Masks
- Linear-Fresnel-Zone-Plate-Based Two-State Alignment Method for Sub-0.25 μm X-Ray Lithography System
- Performance of the Modified Suss XRS 200 / 2M X-Ray Stepper at CXrL
- Evaluation of a Solid State Detector for X-Ray Lithography Dosimetry
- Mechanical Modeling of Projection Electron-Beam Lithography Masks
- Dissolution Study of a Novolak-Based Photoresist Based on a Developer Diffusion Model
- Modeling Clear Phase-Mask Materials for Sub-50 nm X-Ray Application