Evaluation of a Solid State Detector for X-Ray Lithography Dosimetry
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概要
- 論文の詳細を見る
Dosimetry of the X-ray radiation delivered to the mask-wafer plane of a step- per is essential for the develop-ment of a controlled X-ray lithography process. A wafer plane detector using a silicon photo-diode has been designed and evaluated for X-ray lithography applications. This detector was designed to provide real time measurements of beam Huence, delivered dose and beam uniformity. The detector has been evaluated on two CXrL beamlines, one with a scanning mirror and the other a beamline used in conjunction with a Kart Suss XRS 200 stepper that scans mask and wafer (and wafer plane monitor) vertically through the beam for exposures.
- 社団法人応用物理学会の論文
- 1994-12-30
著者
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Anderson Paul
Center For X-rct.y Lithography
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Anderson Paul
Center For X-ray Lithography University Of Wisconsin
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Cerrina Franco
Center For X-rct.y Lithography
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Cerrina Franco
Center For Nanotechnology University Of Wisconsin-madison
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Yamazaki Kuniaki
Motorola Inc.
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Leonard Quinn
Center For X-rct.y Lithography
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Leonard Quinn
Center For X-ray Lithography University Of Wisconsin
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Wells Gregory
Center For X-rct.y Lithography
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Wells Gregory
Center For X-ray Lithography University Of Wisconsin
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Waldo Whit
Motorola Inc.
関連論文
- Mechanical Response of X-Ray Masks
- Linear-Fresnel-Zone-Plate-Based Two-State Alignment Method for Sub-0.25 μm X-Ray Lithography System
- Performance of the Modified Suss XRS 200 / 2M X-Ray Stepper at CXrL
- Evaluation of a Solid State Detector for X-Ray Lithography Dosimetry
- Dissolution Study of a Novolak-Based Photoresist Based on a Developer Diffusion Model
- Modeling Clear Phase-Mask Materials for Sub-50 nm X-Ray Application