Performance of the Modified Suss XRS 200 / 2M X-Ray Stepper at CXrL

概要

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An XRS 200 model 2M X-ray stepper has been installed at the Center for X-ray Lithography. This paperdescribes the capability of the machine and its installation. Of greater interest is the performance the stepper gives with respect to the dose control and the mask/wafer alignment. How robust a process is depends on the latitude of each process parameter and the control tolerance accorded the machines and materials that affect eachone. The dose repeatabillty and uniformity is determined by the optical elements in the beamline, the helium delivery system, and the accuracy of the scanning stage. Test results are reported for dose control using three separate methods. The scan speed is measured using Suss supplied equipment and is verified separately by CXrL's own technique. The dose delivered is analysed by the response of radiachromic film. Also important is the behavior and performance of the ALX-1OO alignment system. The optical set-up is described as a model that includes the ALX hardware and illumination as well as the mask and wafer. The signal and contrast from the mask and wafer are compared to data for several substrates. A figure of merit is discussed for determining which membranes will give the best overlay.
社団法人応用物理学会の論文
1994-12-30