Chemical Analysis of Surface by Fluorescent X-Ray Spectroscopy Using RHEED-SSD Method
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概要
- 論文の詳細を見る
A new RHEED apparatus combined with a Si(Li) solid-state detector has been constructed, and spectroscopy of fluorescent X-rays emitted during RHEED observation has been carried out using the detector. Preliminary measurements have revealed the usefulness of this apparatus both for chemical analysis of surfaces and for investigating the behaviour of incident electrons in surface layers. When Ag thin films evaporated on a clean Si(111) surface were studied, the smallest detectable amount was about 0.02Å in mean thickness. The penetration depth of the primary electron beam in the Ag film at an accelerating voltage of 20 kV was estimated to be 33.0Å from analysis of the intensity of AgLα and AgLβ lines with increasing thickness of the Ag films.
- 社団法人応用物理学会の論文
- 1980-08-05
著者
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Ino Shozo
The Research Institute For Iron Steel And Other Metals
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ICHIKAWA Toshihiro
The Research Institute for Iron, Steel and Other Metals, Tohoku University
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Okada Shozo
The Research Institute For Iron Steel And Other Metals Tohoku University
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Ichikawa Toshihiro
The Research Institute For Iron Steel And Other Metals
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