Control of Plasma Potential with an Electron Emissive Grid in a Q-Machine
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概要
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Control of plasma potential is studied with a BaO-coated grid which is heated by the thermal radiation of a hot plate in a single-ended Q-machine using potassium. The plasma potential V_2 is varied by electrons emitted from the grid. When an a.c voltage v_ex (6-80 kHz) is superposed on the bias voltage V_g of the grid, the grid excites two modes of oscillations. The first mode is an ion wave or a free streaming with a phase velocity of about 2.2 × 10^5 cm/s. The second mode is a potential oscillation φ_2 whose amplitude is almost constant over the plasma column, and the phase velocity is very high (higher than the thermal velocity of electrons 3.7 x 10^7 cm/s). The efficiency for exciting the second mode φ_2/v_ex is large (0.4 at V_g= -2 V) and depends heavily onthe bias voltage V_g.
- 社団法人応用物理学会の論文
- 1977-04-05
著者
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HIOKI Yoshiaki
Daido Institute of Technology
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Okuda Takayoshi
Faculty Of Engineering Nagoya University
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