Preparation of Ferromagnetic MnCuBi Thin Films by an rf-Sputtering

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概要

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• An rf-sputtering technique has been investigated for the preparation. of ferromagnetic MnCuBi thin films. The films are amorphous upon deposition and postdeposition annealing is required in order to crystallize them. The optimum substrate temperature for complete crystallization ranges between 90 and 150℃. In the 380 Å thick films on a fused quartz substrate kept at 90℃, complete magnetization orientation normal to the film plane is realized. These films have a Curie temperature of 160℃ and a room-temperature polar Faraday rotation of 2×10^5 degrees/cm at a wavelength of 6328 Å. A preliminary thermomagnetic writing experiment on the film was conducted.

• 社団法人応用物理学会の論文
• 1976-11-05

著者

• Katsui Akinori

  Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

• Terui Hiroshi

  Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

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• Preparation of Ferromagnetic MnCuBi Thin Films by an rf-Sputtering

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