Dielectric Constant and Refractive Index of Boron Monophosphide
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1976-10-05
著者
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Takenaka Takao
Department Of Electronics Sophia University
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SHOHNO Katsufusa
Department of Electronics, Sophia University
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TAKIGAWA Mitsuharu
Department of Electronics, Sophia University
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Shohno Katsufusa
Department Of Electronics Sophia University
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Takigawa Mitsuharu
Department Of Electronics Sophia University
関連論文
- Double-Layer Epitaxial Growth of Si and B_P_2 on Si Substrates and Some Electrical Properties of Si Layers
- Hardness of Boron Monophosphide
- Dielectric Constant and Refractive Index of Boron Monophosphide
- Boron Monophosphide and Some of Its Electrical Properties
- Hetero-Epitaxial Growth of Lower Boron Arsenide on Si Substrate Using AsH_3-B_2H_6-H_2 System
- Hetero-Epitaxial Growth of Boron Monophosphide on Silicon Substrate Using B_2H_6-PH_3-H_2 System
- Hetero-Epitaxial Growth of Lower Boron Phosphide on Silicon Substrate Using PH_3-B_2H_6-H_2 System