The Effect of Gas Plasma Irradiation on Transistor
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1973-05-05
著者
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ABE Haruhiko
Central Research Laboratory, Mitsubishi Electric Corp.
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Abe Haruhiko
Central Research Lab. Mitsubishi Electric Corp.
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KOMIYA Hiroyoshi
Central Research Laboratory, Mitsubishi Electric Corp.
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Matsui Hajime
Kitaitami Works Mitsubishi Electric Corp.
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DEMIZU Kiyoshi
Kitaitami Works, Mitsubishi Electric Corp.
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Demizu Kiyoshi
Kitaitami Works Mitsubishi Electric Corp.
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Komiya Hiroyoshi
Central Research Laboratory Mitsubishi Electric Corp.
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Komiya Hiroyoshi
Central Research Lab. Mitsubishi Electric Corp.
関連論文
- Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma : A-1: DEVICE TECHNOLOGY (I)
- Photosensitive Electron Spin Resonance in ZnSe : Si Crystals
- Electron Spin Resonance of Eu^ in ZnSe
- The Effect of Gas Plasma Irradiation on Transistor
- Application of Diffusion from Implanted Polycrystalline Silicon to Bipolar Transistors : A-2: DEVICE TECHNOLOGY (II)
- Etching Characteristics of Silicon and its Compounds by Gas Plasma
- Formation of Thin Oxide Films of Silicon by Gas Plasma
- A New Undercutting Phenomenon in Plasma Etching
- Observation of Oscillatory Bias Dependence of Metal-Oxide-Semiconductor Capacitance