Etching Characteristics of Silicon and its Compounds by Gas Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1973-01-05
著者
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Abe Haruhiko
Central Research Lab. Mitsubishi Electric Corp.
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Abe Haruhiko
Central Research Lab. Mitsubishi Electric Corporation
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Enomoto Tatsuya
Kitaitami Works Mitsubishi Electric Corporation
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SONOBE Yukio
Kitaitami Works, Mitsubishi Electric Corporation
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Sonobe Yukio
Kitaitami Works Mitsubishi Electric Corporation
関連論文
- Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma : A-1: DEVICE TECHNOLOGY (I)
- The Effect of Gas Plasma Irradiation on Transistor
- Etching Characteristics of Silicon and its Compounds by Gas Plasma
- Formation of Thin Oxide Films of Silicon by Gas Plasma
- A New Undercutting Phenomenon in Plasma Etching
- Observation of Oscillatory Bias Dependence of Metal-Oxide-Semiconductor Capacitance