Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma : A-1: DEVICE TECHNOLOGY (I)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文

著者

• Nishimoto Akira

  Central Research Laboratory Mitsubishi Electric Corp.

• ABE Haruhiko

  Central Research Laboratory, Mitsubishi Electric Corp.

• NISHIOKA Kyusaku

  Kita-itami Works, Mitsubishi Electric Corp.

• TAMURA Setsuko

  Kita-itami Works, Mitsubishi Electric Corp.

• Nishioka Kyusaku

  Kita-itami Works Mitsubishi Electric Corp.

• Abe Haruhiko

  Central Research Lab. Mitsubishi Electric Corp.

• Tamura Setsuko

  Kita-itami Works Mitsubishi Electric Corp.

関連論文

• Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma : A-1: DEVICE TECHNOLOGY (I)
• The Effect of Gas Plasma Irradiation on Transistor
• Etching Characteristics of Silicon and its Compounds by Gas Plasma
• Formation of Thin Oxide Films of Silicon by Gas Plasma
• A New Undercutting Phenomenon in Plasma Etching
• Observation of Oscillatory Bias Dependence of Metal-Oxide-Semiconductor Capacitance

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