Observation of Oscillatory Bias Dependence of Metal-Oxide-Semiconductor Capacitance

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1973-07-05

著者

• Abe Haruhiko

  Central Research Lab. Mitsubishi Electric Corp.

• Abe Haruhiko

  Central Research Laboratory Mitsubishi Electric Corporation

関連論文

• Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma : A-1: DEVICE TECHNOLOGY (I)
• The Effect of Gas Plasma Irradiation on Transistor
• Etching Characteristics of Silicon and its Compounds by Gas Plasma
• Formation of Thin Oxide Films of Silicon by Gas Plasma
• A New Undercutting Phenomenon in Plasma Etching
• Observation of Oscillatory Bias Dependence of Metal-Oxide-Semiconductor Capacitance

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