Focusing Field Emission Arrays Constructed by Self-Aligned Photolithography (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)

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概要

• 論文の詳細を見る

• A self-aligned photolithography has been proposed to construct double-gated field-emission array. The originalities of the present method consist in the use of the Spindt type emitters and the diameter-adjustable focusing gates. A scanning electron microscope image shows the microstructure of the field-emission array, where the ratio of the focusing gate diameter to that of the extraction gate is about 2.

• 社団法人映像情報メディア学会の論文
• 2000-10-20

著者

• Zhang Jianjun

  Institute Of Photoelectronics Nankai Univ.

• Qu Xiaosheng

  Department Of Electronic Engineering Thsinghua University

• Du Bingchu

  Department Of Electronics Engineering Tsinghua University

• Zhang Jinchi

  Department of Electronics Engineering, Tsinghua University

• Li Dejie

  Department of Electronics Engineering, Tsinghua University

• Yao Baolun

  Department of Electronics Engineering, Tsinghua University

• Li D

  Department Of Electronic Engineering Thsinghua University

• Yao Baolun

  Department Of Electronic Engineering Thsinghua University

• Qu Xiaoshemg

  Department Of Electronics Engineering Tsinghua University

• Li Dejie

  Department of electronic engineering, Thsinghua University

関連論文

• 新型混合双光束激光退火法的模〓分析
• NUMERICAL SIMULATION ON A NOVEL MIXED DUAL BEAM LASER CRYSTALLIZATION METHOD
• Focusing Field Emission Arrays Constructed by Self-Aligned Photolithography (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)
• Focusing Field Emission Arrays Constructed by Self-Aligned Photolithography
• 新型混合双光束激光退火法的模〓分析
• Investigation on the Simulating Field and Track of Electrons in FFEA (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)
• Investigation on the Simulating Field and Track of Electrons in FFEA

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