Investigation on the Simulating Field and Track of Electrons in FFEA
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概要
- 論文の詳細を見る
A distribution graph of electronic potential and track near cathode microtip in FFEA was obtained by finite difference simulating three dimensions for texture of double gate FFEA. It is clearly a result that electrons focusing effect becomes stronger as the focus electrode bias decreases toward the tip potential. If negative focusing electrode bias, we may affirm that the electronic lens repels almost all electrons and finally return to the grid electrode. The potential of gate electrode almost dose not affect the trajectories of electrons from microtip by the quantum tunneling metal cathode, which can only increase electronic amount as voltage applied gate become more higher. The electrons that are of bigger shooting angle will be embarrassed as diameter of focus electrode reduce.
- 社団法人電子情報通信学会の論文
- 2000-10-13
著者
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Qu Xiaosheng
Department Of Electronic Engineering Thsinghua University
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Li Dejie
Department of Electronics Engineering, Tsinghua University
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Li D
Department Of Electronic Engineering Thsinghua University
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Yao Baolun
Department Of Electronic Engineering Thsinghua University
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Qu Xiaoshemg
Department Of Electronics Engineering Tsinghua University
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Li Dejie
Department of electronic engineering, Thsinghua University
関連論文
- Focusing Field Emission Arrays Constructed by Self-Aligned Photolithography (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)
- Focusing Field Emission Arrays Constructed by Self-Aligned Photolithography
- Investigation on the Simulating Field and Track of Electrons in FFEA (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)
- Investigation on the Simulating Field and Track of Electrons in FFEA