Study on Improved Resolution of Thick Film Resist

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概要

• 論文の詳細を見る
• 社団法人電子情報通信学会の論文
• 2002-04-01

著者

• MIYAKE Yasuhiro

  Litho Tech Japan Corporation

• Miyake Yasuhiro

  Litho Tech Japan Corp.

• Sekiguchi Atsushi

  Litho Tech Japan Corp.

• SENSU Yoshihisa

  Litho Tech Japan Corporation

• Sekiguchi Atsushi

  Litho Tech Japan Corp

関連論文

• Development of Photochemical Analysis System for F_2-Excimer Laser Lithography Processes
• Analysis of Deprotection Reaction in Chemically Amplified Resists Using an Fourier Transform Infrared Spectrometer with an Exposure Tool
• Study on Improved Resolution of Thick Film Resist
• Measurement of Parameters for Simulation of 193 nm Lithography Using Fourier Transform Infrared Baking System
• Approach for High-resolution of Chemically Amplified Resists Using Rate Editor Software

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