投影型二次イオン質量分析装置を用いた微小領域測定における制限視野法の効果(<特集>表面・界面・薄膜と分析化学)

概要

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Regarding micro-area analysis by means of scanning SIMS (micro-probe mode), the effect of the primary ion-beam size and its spreading tail causes some problems, which usually lead to a degradation of the spatial resolution of the analysis and, more directly, to a worse detection limit for some impurities. We investigated the usefulness of the field-limiting method in order to improve the detection limit in a micro-area SIMS analysis using a CAMECA IMS-4f type apparatus, which is capable of both microscope and microprobe measurements. By evaluating the detected background level of (P+^<30>Si)^- from a P-implanted Si sample, it was confirmed that the field-limiting method improves the detection limit of this ion species by a factor of ten. This might be achieved by a elimination of the interfering ions (^<29>Si^<16>O_2)^- ejected from the outskirts of the rastering area of the primary ion-beam.
社団法人日本分析化学会の論文
1991-11-05