イオン照射層に生じる固有応力の評価

概要

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Ion-beam processing such as absorption (deposition), sputtering or implantation creates a disordered crystalline structure in the thermodynamical nonequilibrium state. Intrinsic stress within the disordered surface layer caused by the incident ions was estimated using both molecular dynamics (MD) simulations and continuum mechanics considerations. We proposed one estimation of the anisotropic elastic stress derived from dilatation of the disordered layer which was obtained by applying the Voronoi analysis or the statistical treatment to the results of MD analyses. It was noted that the incident ions with lower accelerating energy induced the tensile stress in the layer. And the stress field became compressive as the accelerating energy increased because of the occurrence of interstitials. Some aspects of the local volume change were also analyzed from the distribution of the atomic volumes within the Voronoi polyhedra.
一般社団法人日本機械学会の論文
1993-08-25