ゾル-ゲル法を利用したLaF_3薄膜の作製

概要

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Lanthanum fluoride thin films were prepared on silica glass substrates by a sol-gel method using trifluoroacetic acid(TFA)as a fluorine source. A coating solution was produced from lanthanum acetate and trifluoroacetic acid dissolved in 2-propanol. Trifluoroacetate gel films were formed by spin coating the sol, which were converted to LaF_3 thin films by heat-treatment at 300-500℃ for 10 min. The formation of LaF_3 is considered to result from the reaction between lanthanum ions and the fluorine species generated by the decomposition of trifluoroacetate ions at elevated temperatures. The film fired at 300℃ had a smooth surface with a grain size of 30 nm. Cracks and voids were only observed in the films fired at 400 and 500℃. The films fired at 300 and 400℃ exhibited transmittance of greater than 90% in the visible region.
社団法人日本セラミックス協会の論文
1998-01-01