Dependence of Plasma Profiles on Ech Power Absorption in Heliotron-E

概要

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Dependence of plasma profiles on the power absorjotion of electron cyclotron heating is experimentally studied in the Heliotron-B helical device. A foctrsed Gaussian beazta with controllablepolarization makes it possible to change the power absorption. The electron density and tetnperature profiles are sensitive to the single pass absorption rate. The electron ternperattnre profile ispeaked azad the density profile is holloxv as the single pass absorption increases. The resonanceposition is also irmportant for deterraaining their profiles. The electron ternperatture profile ischanged frotn a peaked one to a hollow one, depending on the resonance position. The non-diffvxsive ovrtward flow, which is necessary to forxn a hollow temperature profile, is estinaated byusing a simple heat transport tnodel.
社団法人日本物理学会の論文
1998-05-15