Fractal Property for the Resistance of Deposited Films
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概要
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The geometrical fractal property of films formed by random deposition has beenstudied. In this paper we study the fractal property of the resistance of films in theeary stage of deposition. The films are grown by depositing particles of unit squareson segments divided into unit length (cells). First we define the fractal dimension forthe resistance; then we compute the resistances by the finite-element method. It is5hown that the resistance of large clusters has a fractal dimension of 1.14.[fractal, random deposition, resistance, film, surface, finite-element method, lj computer simulationI
- 社団法人日本物理学会の論文
- 1992-01-15
著者
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Nakamura Motoyuki
Plasma Research Center University Of Tsukuba
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Nakamura Mitsunobu
Department Of Electronic Engineering Tamagawa University
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