Effect of Pressure on the Raman Shift in Ge
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概要
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Pressure effect on the first order Raman shift in Ge was measured up to themetallic transformation at 100 kbar using a diamond anvil cell. The optic modeGrQneisen parameter was estimated to be 0.88:E0.08. The semiconductor-metaltransition was confirmed by observing the Raman profile of metastable Ge III.Two strong Raman peaks of Ge III were observed at freqtteneies co=250.4.2 cm 'and?298f2cm '
- 社団法人日本物理学会の論文
- 1978-09-15
著者
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Minomura Shigeru
Institute For Solid State Physics The University Of Tokyo
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Minomura Shigeru
Institute For Solid State Physics University Of Tokyo
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Asaumi Katsuyuki
Institute For Solid State Physics University Of Tokyo
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MINOMURA Shigeru
Institute for Solid State Physics,University of Tokyo
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